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Design and fabrication of multi-layers antireflection coating consisting of MgF2 and SiO2 | ||
| Progress in Physics of Applied Materials | ||
| دوره 3، شماره 2 - شماره پیاپی 5، اسفند 2023، صفحه 141-146 اصل مقاله (580.48 K) | ||
| نوع مقاله: Original Article | ||
| شناسه دیجیتال (DOI): 10.22075/ppam.2023.32214.1067 | ||
| نویسندگان | ||
| Hassan Salmaniannezhad1، 2؛ Hossein Salmaniannezhad1، 2؛ Reza Zarei Moghadam* 3؛ Mohammadreza Khani1، 2؛ Mahdi Ardani1، 2؛ Babak Shokri1، 2 | ||
| 1Laser and Plasma Research Institute, Shahid Beheshti University, Tehran, Iran | ||
| 2Department of Physics, Shahid Beheshti University, Tehran, Iran | ||
| 3Department of Physics, Faculty of Sciences, Arak University, Arak, Iran | ||
| تاریخ دریافت: 10 آبان 1402، تاریخ بازنگری: 28 آذر 1402، تاریخ پذیرش: 02 دی 1402 | ||
| چکیده | ||
| In this research, MgF2 and SiO2 thin films were prepared by the magnetron sputtering method on glass and ITO substrates. The crystal structure, morphology, and antireflection performance of the coatings were characterized using X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), and ultraviolet spectrophotometry (UV-vis) techniques, respectively. Furthermore, by utilizing both experimental characterization and optical film design tools, the best experimental parameters for every coating were identified. FESEM images confirmed proper growth of the layers on the substrates. EDAX analysis revealed that the manufactured layer consisted of Magnesium fluoride and silica. The study of optical properties demonstrated that the average transmission in the 400-1000 nanometer range exceeded 99%, indicating good agreement with theoretical results. Furthermore, the use of ITO as the substrate reduced the bandgap. | ||
| کلیدواژهها | ||
| MgF2 and SiO2 thin films؛ sputtering؛ ITO substrates | ||
| مراجع | ||
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