Surface characterization of Al thin film dependent on the substrate using fractal geometry | ||
| Progress in Physics of Applied Materials | ||
| دوره 3، شماره 2 - شماره پیاپی 5، اسفند 2023، صفحه 177-183 اصل مقاله (1.06 M) | ||
| نوع مقاله: Original Article | ||
| شناسه دیجیتال (DOI): 10.22075/ppam.2023.32439.1069 | ||
| نویسندگان | ||
| Mahsa Fakharpour* 1؛ Maryam Gholizadeh Arashti2؛ Saeed Hesami Tackallou3؛ Babak Zamani4 | ||
| 1Department of physics, Maybod branch, Islamic Azad University, Maybod, Iran | ||
| 2Department of Physics, Yadegar-e-Imam Khomeini (RAH) Shahre Rey Branch, Islamic Azad University, Tehran, Iran | ||
| 3Department of Biology, Central Tehran Branch, Islamic Azad University, Tehran, Iran | ||
| 4Department of Physics , Central Tehran Branch, Islamic Azad University, Tehran, Iran | ||
| چکیده | ||
| In this paper, Al films were deposited on glass and steel substrates by using thermal evaporation technique. X-ray diffraction (XRD) analysis was used for structural characterization of Al thin films. It was found that the growth process mechanism of Al film on two substrates was different. The difference in the growth mechanism and microstructures affects the surface properties. Atomic force microscope (AFM) and field emission scanning electron microscope (FESEM) have been used to describe the surface morphology and fractal properties of Al films. The fractal properties obtained by autocorrelation function (ACF), height-height correlation function (H(r)) and Minkowski function are described and compared with each other. The results of 2D AFM images show that the Al film on the steel substrate has higher surface roughness, roughness exponent, and lateral correlation length compared to the glass substrate. However, the Al film on the glass substrate has a higher spatial complexity with a fractal dimension of Df = 2.88. | ||
| کلیدواژهها | ||
| Al film؛ Fractal؛ Substrate؛ AFM | ||
| مراجع | ||
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